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Study on etching anisotropy of Si(hkl) planes in solutions with different KOH and isopropyl alcohol concentrations
K. P. Rola, I. ZubelVolume:
29
Langue:
english
Pages:
7
DOI:
10.2478/s13536-011-0047-z
Date:
December, 2011
Fichier:
PDF, 883 KB
english, 2011