High-performance dual-gate CMOS utilizing a novel self-aligned pocket implantation (SPI) technology
Hori, A., Segawa, M., Kameyama, S., Yasuhira, M.Volume:
40
Année:
1993
Langue:
english
Pages:
7
DOI:
10.1109/16.231578
Fichier:
PDF, 688 KB
english, 1993