
Dose-rate effects on the formation of ultra-shallow junctions with low-energy B+ and BF2+ ion implants
Daniel F Downey, Carlton M Osburn, James J Cummings, Sonu Daryanani, Scott W FalkVolume:
308-309
Année:
1997
Langue:
english
Pages:
8
DOI:
10.1016/s0040-6090(97)00494-x
Fichier:
PDF, 884 KB
english, 1997