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Transparent-conductive indium tin oxide films fabricated by atmospheric r.f. plasma deposition technique
D.H. Lee, R.W. Moss, K.D. Vuong, M. Dietrich, R.A. Condrate Sr., X.W. WangVolume:
290-291
Année:
1996
Langue:
english
Pages:
4
DOI:
10.1016/s0040-6090(96)09063-3
Fichier:
PDF, 210 KB
english, 1996