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Microstructure characterization of microcrystalline silicon thin films deposited by very high frequency plasma-enhanced chemical vapor deposition by spectroscopic ellipsometry
He Zhang, Xiaodan Zhang, Changchun Wei, Jian Sun, Xinhua Geng, Shaozhen Xiong, Ying ZhaoVolume:
520
Année:
2011
Langue:
english
Pages:
5
DOI:
10.1016/j.tsf.2011.04.166
Fichier:
PDF, 805 KB
english, 2011