Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1996 Vol. 118; Iss. 1-4
In situ analysis of thin film deposition process using time of flight (TOF) ion beam analysis methods
Jaemo Im, Alan R. Krauss, Yuping Lin, J.A. Schultz, Orlando H. Auciello, Dieter M. Gruen, R.P.H. ChangVolume:
118
Année:
1996
Langue:
english
Pages:
10
DOI:
10.1016/0168-583x(95)01205-2
Fichier:
PDF, 836 KB
english, 1996
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