
Germanium surface passivation and atomic layer deposition of high- k dielectrics—a tutorial review on Ge-based MOS capacitors
Xie, Qi, Deng, Shaoren, Schaekers, Marc, Lin, Dennis, Caymax, Matty, Delabie, Annelies, Qu, Xin-Ping, Jiang, Yu-Long, Deduytsche, Davy, Detavernier, ChristopheVolume:
27
Langue:
english
Journal:
Semiconductor Science and Technology
DOI:
10.1088/0268-1242/27/7/074012
Date:
July, 2012
Fichier:
PDF, 2.15 MB
english, 2012