X-ray spectroscopic examination of thin HfO2films ALD- and MOCVD-grown on the Si(100) surface
A. A. Sokolov, A. A. Ovchinnikov, K. M. Lysenkov, D. E. Marchenko, E. O. FilatovaVolume:
55
Langue:
english
Pages:
6
DOI:
10.1134/s1063784210070200
Date:
July, 2010
Fichier:
PDF, 218 KB
english, 2010