Erdmann, Andreas : rechercher sur Z-Library

Le plus grand référentiel d'articles scientifiques au monde. 70,000,000+ d'articles gratuitement.

Don't use scam websites

Livres
Articles (500+)
Les plus populaires
Liste
- Liste
- Tableau

51

The Avrunin–Scott theorem for quantum complete intersections

Petter Andreas Bergh, Karin Erdmann

Journal:

Journal of Algebra

Année:

2009

Langue:

english

Fichier:

PDF, 169 KB

english, 2009

52

An overview of the polymer-to-metal direct-adhesion hybrid technologies for load-bearing automotive components

M. Grujicic, V. Sellappan, M.A. Omar, Norbert Seyr, Andreas Obieglo, Marc Erdmann, Jochen Holzleitner

Journal:

Journal of Materials Processing Technology

Année:

2008

Langue:

english

Fichier:

PDF, 651 KB

english, 2008

53

The representation dimension of Hecke algebras and symmetric groups

Petter Andreas Bergh, Karin Erdmann

Journal:

Advances in Mathematics

Année:

2011

Langue:

english

Fichier:

PDF, 183 KB

english, 2011

54

Efficacy of bacteriocin-containing cell-free culture supernatants from lactic acid bacteria to control Listeria monocytogenes in food

H. Andreas Hartmann, Thomas Wilke, Ralf Erdmann

Journal:

International Journal of Food Microbiology

Année:

2011

Langue:

english

Fichier:

PDF, 394 KB

english, 2011

55

Simulation of 3D inclined/rotated UV lithography and its application to microneedles

Shijie Liu, Georg Roeder, Gulnur Aygun, Kristian Motzek, Peter Evanschitzky, Andreas Erdmann

Journal:

Optik - International Journal for Light and Electron Optics

Année:

2012

Langue:

english

Fichier:

PDF, 545 KB

english, 2012

56

A molecular assembly system that renders antigens of choice highly repetitive for induction of protective B cell responses

Andrea Jegerlehner, Alain Tissot, Franziska Lechner, Peter Sebbel, Iris Erdmann, Thomas Kündig, Thomas Bächi, Tazio Storni, Gary Jennings, Paul Pumpens, Wolfgang A Renner, Martin F Bachmann

Journal:

Année:

2002

Langue:

english

Fichier:

PDF, 401 KB

english, 2002

57

PAS1, a yeast gene required for peroxisome biogenesis, encodes a member of a novel family of putative ATPases

Ralf Erdmann, Franziska F. Wiebel, Arne Flessau, Joanna Rytka, Andreas Beyer, Kai-Uwe Fröhlich, Wolf-H. Kunau

Journal:

Année:

1991

Langue:

english

Fichier:

PDF, 2.16 MB

english, 1991

58

High-order aberration measurement technique based on a quadratic Zernike model with optimized source

Yang, Jishuo, Wang, Xiangzhao, Li, Sikun, Duan, Lifeng, Yan, Guanyong, Xu, Dongbo, Bourov, Anatoly Y., Erdmann, Andreas

Journal:

Optical Engineering

Année:

2013

Langue:

english

Fichier:

PDF, 7.53 MB

english, 2013

59

Degrading magnesium screws ZEK100: biomechanical testing, degradation analysis and soft-tissue biocompatibility in a rabbit model

Reifenrath, Janin, Angrisani, Nina, Erdmann, Nina, Lucas, Arne, Waizy, Hazibullah, Seitz, Jan M, Bondarenko, Alexander, Meyer-Lindenberg, Andrea

Journal:

Biomedical Materials

Année:

2013

Langue:

english

Fichier:

PDF, 1.55 MB

english, 2013

60

How to Include Chromosome X in Your Genome-Wide Association Study

König, Inke R., Loley, Christina, Erdmann, Jeanette, Ziegler, Andreas

Journal:

Genetic Epidemiology

Année:

2014

Langue:

english

Fichier:

PDF, 253 KB

english, 2014

61

[IEEE 2008 IEEE Nuclear Science Symposium and Medical Imaging conference (2008 NSS/MIC) - Dresden, Germany (2008.10.19-2008.10.25)] 2008 IEEE Nuclear Science Symposium Conference Record - A novel environment for Visual Physics Analysis (VISPA)

Actis, Oxana, Erdmann, Martin, Fischer, Robert, Hinzmann, Andreas, Kirsch, Matthias, Klimkovich, Tatsiana, Muller, Gero, Plum, Matthias, Steggemann, Jan

Année:

2008

Langue:

english

Fichier:

PDF, 4.19 MB

english, 2008

62

The improvement in adhesion of polyurethane-polypropylene composites by short-time exposure of polypropylene to low and atmospheric pressure plasmas

Florian Friedrich, Jorg, Unger, Wolfgang, Lippitz, Andreas, Gross, Thomas, Rohrer, Paul, Saur, Wolfgang, Erdmann, Jürgen, Gorsler, Hans-Viktor

Journal:

Journal of Adhesion Science and Technology

Année:

1995

Langue:

english

Fichier:

PDF, 9.17 MB

english, 1995

63

Photomasks for Semiconductor Lithography: From Simple Shadow Casters to Complex 3D Scattering Objects

Erdmann, Andreas, Reibold, David, Fühner, Tim, Evanschitzky, Peter

Journal:

Advances in Science and Technology

Année:

2008

Langue:

english

Fichier:

PDF, 859 KB

english, 2008

64

Fast model for mask spectrum simulation and analysis of mask shadowing effects in extreme ultraviolet lithography

Liu, Xiaolei, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Erdmann, Andreas

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2014

Langue:

english

Fichier:

PDF, 3.03 MB

english, 2014

65

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Optimum ArFi laser bandwidth for 10nm node logic imaging performance

Lai, Kafai, Erdmann, Andreas, Alagna, Paolo, Zurita, Omar, Timoshkov, Vadim, Wong, Patrick, Rechtsteiner, Gregory, Baselmans, Jan, Mailfert, Julien

Année:

2015

Langue:

english

Fichier:

PDF, 1.32 MB

english, 2015

66

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - UV-LED exposure system for low-cost photolithography

Lai, Kafai, Erdmann, Andreas, Yapici, Murat Kaya, Farhat, Ilyas

Année:

2014

Langue:

english

Fichier:

PDF, 605 KB

english, 2014

67

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Multicolor, visible-light nanolithography

Lai, Kafai, Erdmann, Andreas, Fourkas, John T., Tomova, Zuleykhan

Année:

2015

Langue:

english

Fichier:

PDF, 334 KB

english, 2015

68

In situ aberration measurement technique based on an aerial image with an optimized source

Yan, Guanyong, Wang, Xiangzhao, Li, Sikun, Yang, Jishuo, Xu, Dongbo, Duan, Lifeng, Bourov, Anatoly Y., Erdmann, Andreas

Journal:

Optical Engineering

Année:

2013

Langue:

english

Fichier:

PDF, 2.35 MB

english, 2013

69

Mask diffraction analysis and optimization for extreme ultraviolet masks

Erdmann, Andreas

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Année:

2010

Langue:

english

Fichier:

PDF, 1.17 MB

english, 2010

70

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Critical assessment of the transport of intensity equation as a phase recovery technique in optical lithography

Lai, Kafai, Erdmann, Andreas, Shanker, Aamod, Sczyrba, Martin, Connolly, Brid, Kalk, Franklin, Neureuther, Andy, Waller, Laura

Année:

2014

Langue:

english

Fichier:

PDF, 906 KB

english, 2014

71

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Optical lithography with and without NGL for single-digit nanometer nodes

Lai, Kafai, Erdmann, Andreas, Lin, Burn J.

Année:

2015

Langue:

english

Fichier:

PDF, 2.59 MB

english, 2015

72

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Analytical analysis for impact of polarization aberration of projection lens on lithographic imaging quality

Lai, Kafai, Erdmann, Andreas, Shen, Lina, Li, Sikun, Wang, Xiangzhao, Yan, Guanyong

Année:

2015

Langue:

english

Fichier:

PDF, 315 KB

english, 2015

73

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Patterning process exploration of metal 1 layer in 7nm node with 3D patterning flow simulations

Lai, Kafai, Erdmann, Andreas, Gao, Weimin, Ciofi, Ivan, Saad, Yves, Matagne, Philippe, Bachmann, Michael, Oulmane, Mohamed, Gillijns, Werner, Lucas, Kevin, Demmerle, Wolfgang, Schmoeller, Thomas

Année:

2015

Langue:

english

Fichier:

PDF, 1003 KB

english, 2015

74

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Evolving optical lithography without EUV

Lai, Kafai, Erdmann, Andreas, Flagello, Donis G., Renwick, Stephen P.

Année:

2015

Langue:

english

Fichier:

PDF, 2.01 MB

english, 2015

75

SPIE Proceedings [SPIE SPIE Optical Systems Design - Jena, Germany (Monday 7 September 2015)] Optical Systems Design 2015: Computational Optics - Topology optimized design of carpet cloaks based on a level set approach

Smith, Daniel G., Wyrowski, Frank, Erdmann, Andreas, Fujii, Garuda, Nakamura, Masayuki

Année:

2015

Langue:

english

Fichier:

PDF, 702 KB

english, 2015

76

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Analysis of EUV mask multilayer defect printing characteristics

Erdmann, Andreas, Evanschitzky, Peter, Bret, Tristan, Jonckheere, Rik, Naulleau, Patrick P., Wood II, Obert R.

Année:

2012

Langue:

english

Fichier:

PDF, 2.54 MB

english, 2012

77

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Reducing the substrate dependent scanner leveling effect in low-k1 contact printing

Lai, Kafai, Erdmann, Andreas, Chang, C. S., Tseng, C. F., Huang, C. H., Yang, Elvis, Yang, T. H., Chen, K. C.

Année:

2015

Langue:

english

Fichier:

PDF, 629 KB

english, 2015

78

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Resist toploss modeling for OPC applications

Lai, Kafai, Erdmann, Andreas, Zuniga, Christian, Deng, Yunfei

Année:

2014

Langue:

english

Fichier:

PDF, 2.12 MB

english, 2014

79

SPIE Proceedings [SPIE SPIE Optical Systems Design - Jena, Germany (Monday 7 September 2015)] Optical Systems Design 2015: Computational Optics - Approximate solution of Maxwell’s equations by geometrical optics

Smith, Daniel G., Wyrowski, Frank, Erdmann, Andreas, Wyrowski, Frank, Zhong, Huiying, Zhang, Site, Hellmann, Christian

Année:

2015

Langue:

english

Fichier:

PDF, 1.94 MB

english, 2015

80

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Impact of bandwidth on contrast sensitive structures for low k1 lithography

Lai, Kafai, Erdmann, Andreas, Conley, Will, Hsieh, Simon, Alagna, Paolo, Hou, Yaching, Martinez, Pedro

Année:

2015

Langue:

english

Fichier:

PDF, 1.78 MB

english, 2015

81

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - 120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography

Lai, Kafai, Erdmann, Andreas, Ohta, Takeshi, Ishida, Keisuke, Kumazaki, Takahito, Tsushima, Hiroaki, Kurosu, Akihiko, Kakizaki, Kouji, Matsunaga, Takashi, Mizoguchi, Hakaru

Année:

2015

Langue:

english

Fichier:

PDF, 683 KB

english, 2015

82

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Model-based HSF using by target point control function

Lai, Kafai, Erdmann, Andreas, Kim, Seongjin, Do, Munhoe, An, Yongbae, Choi, Jaeseung, Yang, Hyunjo, Yim, Donggyu

Année:

2015

Langue:

english

Fichier:

PDF, 463 KB

english, 2015

83

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Resist profile modeling with compact resist model

Lai, Kafai, Erdmann, Andreas, Zuniga, Christian, Deng, Yunfei, Granik, Yuri

Année:

2015

Langue:

english

Fichier:

PDF, 2.49 MB

english, 2015

84

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 23 February 2014)] Extreme Ultraviolet (EUV) Lithography V - Fast rigorous model for mask spectrum simulation and analysis of mask shadowing effects in EUV lithography

Wood, Obert R., Panning, Eric M., Liu, Xiaolei, Wang, Xiangzhao, Li, Sikun, Yan, Guanyong, Erdmann, Andreas

Année:

2014

Langue:

english

Fichier:

PDF, 2.35 MB

english, 2014

85

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Optical Microlithography XXVIII - Intra-field overlay correction for illumination based distortion

Lai, Kafai, Erdmann, Andreas, Pike, Michael, Brunner, Timothy, Morgenfeld, Bradley, Jing, Nan, Wiltshire, Timothy

Année:

2015

Langue:

english

Fichier:

PDF, 1.18 MB

english, 2015

86

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Mask defect printability in the Self-Aligned Quadruple Patterning (SAQP) process

Erdmann, Andreas, Kye, Jongwook, Furubayashi, Ken, Sho, Koutarou, Miyoshi, Seiro, Yamaguchi, Shinji, Iida, Kazunori, Usui, Satoshi, Morisaki, Tsuyoshi, Sato, Naoki, Mukai, Hidefumi

Année:

2016

Langue:

english

Fichier:

PDF, 416 KB

english, 2016

87

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Rigorous simulation and optimization of the lithography/directed self-assembly co-process

Lai, Kafai, Erdmann, Andreas, Fühner, Tim, Welling, Ulrich, Müller, Marcus, Erdmann, Andreas

Année:

2014

Langue:

english

Fichier:

PDF, 1.65 MB

english, 2014

88

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - CDU budget breakdown as a diagnostic method for imaging sensitivity in HVM

Erdmann, Andreas, Kye, Jongwook, Kim, Young Ki, Samudrala, Pavan, Gomez, Juan-Manuel, Nikolsky, Peter, Anunciado, Roy, Barkelid, Maria, Lee, Shawn, Tian, Ye, Hanson, Justin K.

Année:

2016

Langue:

english

Fichier:

PDF, 975 KB

english, 2016

89

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Expected innovations of optical lithography in the next 10 years

Erdmann, Andreas, Kye, Jongwook, Owa, Soichi, Hirayanagi, Noriyuki

Année:

2016

Langue:

english

Fichier:

PDF, 1.19 MB

english, 2016

90

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Hybrid lithography for triple patterning decomposition and E-beam lithography

Lai, Kafai, Erdmann, Andreas, Tian, Haitong, Zhang, Hongbo, Xiao, Zigang, Wong, Martin D. F.

Année:

2014

Langue:

english

Fichier:

PDF, 615 KB

english, 2014

91

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Periodic sub-100nm structures fabricated by proximity i-line mask-aligner lithography (and self-aligned double patterning)

Erdmann, Andreas, Kye, Jongwook, Bourgin, Yannick, Voigt, Daniel, Käsebier, Thomas, Kley, Ernst-Bernhard, Zeitner, Uwe D.

Année:

2016

Langue:

english

Fichier:

PDF, 2.80 MB

english, 2016

92

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Model-based OPC using the MEEF matrix II

Lai, Kafai, Erdmann, Andreas, Lei, Junjiang, Hong, Le, Lippincott, George, Word, James

Année:

2014

Langue:

english

Fichier:

PDF, 512 KB

english, 2014

93

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Pattern fidelity in multiple-patterning process

Lai, Kafai, Erdmann, Andreas, Yamato, Masatoshi, Natori, Sakurako, Yamauchi, Shohei, Hara, Arisa, Oyama, Kenichi, Yaegashi, Hidetami

Année:

2014

Langue:

english

Fichier:

PDF, 1.71 MB

english, 2014

94

SPIE Proceedings [SPIE Microlithography 2000 - Santa Clara, CA (Sunday 27 February 2000)] Optical Microlithography XIII - Rigorous diffraction analysis for future mask technology

Erdmann, Andreas, Friedrich, Christoph M., Progler, Christopher J.

Année:

2000

Langue:

english

Fichier:

PDF, 1.17 MB

english, 2000

95

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - The solution to enhance i-line stepper applications by improving mix and match process overlay accuracy

Lai, Kafai, Erdmann, Andreas, Sumiyoshi, Yuhei, Sasaki, Ryo, Hasegawa, Yasuo, Ushiku, Kentaro, Sano, Hirotaka, Shigenobu, Atsushi, Takeshita, Bunsuke, Miura, Seiya

Année:

2014

Langue:

english

Fichier:

PDF, 912 KB

english, 2014

96

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Effect of mask 3D and scanner focus difference on OPC modeling and verification

Lai, Kafai, Erdmann, Andreas, Ning, GuoXiang, Cheng, Jacky, Kropinov, Sergey, Litt, Lloyd C., Zhang, Dongqing, Ackmann, Paul, Foong, Yee Mei

Année:

2014

Langue:

english

Fichier:

PDF, 692 KB

english, 2014

97

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - Flexible power 90W to 120W ArF immersion light source for future semiconductor lithography

Lai, Kafai, Erdmann, Andreas, Burdt, R., Thornes, J., Duffey, T., Bibby, T., Rokitski, R., Mason, E., Melchior, J., Aggarwal, T., Haran, D., Wang, J., Rechtsteiner, G., Haviland, M., Brown, D.

Année:

2014

Langue:

english

Fichier:

PDF, 1.87 MB

english, 2014

98

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Next-generation immersion scanner optimizing on-product performance for 7nm node

Erdmann, Andreas, Kye, Jongwook, Yoda, Yasushi, Hayakawa, Akira, Ishiyama, Satoshi, Ohmura, Yasuhiro, Fujimoto, Issei, Hirayama, Toru, Shiba, Yuji, Masaki, Kazuo, Shibazaki, Yuichi

Année:

2016

Langue:

english

Fichier:

PDF, 2.82 MB

english, 2016

99

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 23 February 2014)] Optical Microlithography XXVII - A temperature control algorithm of immersion liquid for immersion lithography

Lai, Kafai, Erdmann, Andreas, He, Junwei, Li, Xiaoping, Lei, Min, Chen, Bing, Wang, Jinchun

Année:

2014

Langue:

english

Fichier:

PDF, 382 KB

english, 2014

100

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Optical Microlithography XXIX - Lithographic imaging-driven pattern edge placement errors at 10nm node

Erdmann, Andreas, Kye, Jongwook, Tyminski, Jacek K., Renwick, Stephen P., Palmer, Shane R., Sakamoto, Julia A., Slonaker, Steven S.

Année:

2016

Langue:

english

Fichier:

PDF, 976 KB

english, 2016